Electrical contacts to two-dimensional transition-metal dichalcogenides

被引:7
|
作者
Wang, Shuxian [1 ]
Yu, Zhihao [2 ,3 ]
Wang, Xinran [2 ,3 ]
机构
[1] Ft Hays State Univ, Kansas Acad Math & Sci, 600 Pk St, Hays, KS 67601 USA
[2] Nanjing Univ, Natl Lab Solid State Microstruct, Sch Elect Sci & Engn, Nanjing 210093, Jiangsu, Peoples R China
[3] Nanjing Univ, Collaborate Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R China
关键词
two-dimension; channel materials; Fin-FET;
D O I
10.1088/1674-4926/39/12/124001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Two-dimensional (2D) transition-metal dichalcogenides (TMDCs) have attracted enormous interests as the novel channel materials for atomically thin transistors. Despite considerable progress in recent years, the transistor performance is largely limited by the excessive contact resistance at the source/drain interface. In this review, a summary of recent progress on improving electrical contact to TMDC transistors is presented. Several important strategies including topology of contacts, choice of metals and interface engineering are discussed.
引用
收藏
页数:8
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