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Influence of Device Geometry on Transport Properties of Topological Insulator Microflakes
被引:0
|作者:
高凡
[1
,2
]
李永庆
[1
,2
,3
,4
]
机构:
[1] Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences
[2] School of Physical Sciences, University of Chinese Academy of Sciences
[3] Songshan Lake Materials Laboratory
[4] CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences
基金:
中国国家自然科学基金;
关键词:
D O I:
暂无
中图分类号:
TB34 [功能材料];
学科分类号:
080501 ;
摘要:
In the transport studies of topological insulators, microflakes exfoliated from bulk single crystals are often used because of the convenience in sample preparation and the accessibility to high carrier mobilities. Here, based on finite element analysis, we show that for the non-Hall-bar shaped topological insulator samples, the measured four-point resistances can be substantially modified by the sample geometry, bulk and surface resistivities,and magnetic field. Geometry correction factors must be introduced for accurately converting the four-point resistances to the longitudinal resistivity and Hall resistivity. The magnetic field dependence of inhomogeneous current density distribution can lead to pronounced positive magnetoresistance and nonlinear Hall effect that would not exist in the samples of ideal Hall bar geometry.
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页码:114 / 121
页数:8
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