Stress and morphology of a nonpolar a-plane GaN layer on r-plane sapphire substrate

被引:0
|
作者
许晟瑞 [1 ]
郝跃 [1 ]
张进成 [1 ]
薛晓咏 [1 ]
李培咸 [2 ]
李建婷 [3 ]
林志宇 [1 ]
刘子扬 [1 ]
马俊彩 [1 ]
贺强 [2 ]
吕玲 [1 ]
机构
[1] Key Laboratory of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University
[2] Zoomview Oprtoelectronic
[3] School of Technical Physics, Xidian University
基金
中央高校基本科研业务费专项资金资助; 中国国家自然科学基金;
关键词
crystal morphology; nonpolar GaN; Raman; metal-organic chemical vapour deposition;
D O I
暂无
中图分类号
TN304.2 [化合物半导体];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
The anisotropic strain of a nonpolar (1120) a-plane GaN epilayer on an r-plane (1102) sapphire substrate, grown by low-pressure metal-organic vapour deposition is investigated by Raman spectroscopy. The room-temperature Raman scattering spectra of nonpolar a-plane GaN are measured in surface and edge backscattering geometries. The lattice is contracted in both the c- and the m-axis directions, and the stress in the m-axis direction is larger than that in the c-axis direction. On the surface of this sample, a number of cracks appear only along the m-axis, which is confirmed by the scanning electron micrograph. Atomic force microscopy images reveal a significant decrease in the root-mean-square roughness and the density of submicron pits after the stress relief.
引用
收藏
页码:421 / 425
页数:5
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