Structural and electrical properties of co-evaporated In,Garich CIGS thin films

被引:0
|
作者
XUE Yu-ming1
机构
基金
中国国家自然科学基金;
关键词
Ga; In; Cu; CIGS; Structural and electrical properties of co-evaporated In; Garich CIGS thin films;
D O I
暂无
中图分类号
O484.4 [薄膜的性质];
学科分类号
080501 ; 1406 ;
摘要
The CIGS thin films are prepared by co-evaporation of elemental In,Ga and Se on the substrates of Mo-coated glasses at 400℃ followed by co-evaporation of elemental Cu and Se at 550℃. We study the structural and electrical properties using XRD,XRF and Hall effect measurements. In general,Cu(In,Ga)5Se8 phase exists when Cu/(In+Ga) ratio is from 0.17 to 0.27,Cu(In,Ga)3Se5 phase exists for Cu/(In+Ga) ratio between 0.27 and 0.41,Cu2(In,Ga)4Se7 and Cu(In,Ga)2Se3.5 phases exist for Cu/(In+Ga) ratio between 0.41 and 0.61,and OVC(or ODC) and CuIn0.7Ga0.3Se2 phases exist when Cu/(In+Ga) ratio is from 0.61 to 0.88. With the increase of Cu/(In+Ga) ratio,the carrier concentrations of the films gradually increase,but the electrical resistivity gradually decreases.
引用
收藏
页码:437 / 439
页数:3
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