Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale [Invited]

被引：1

作者：

Younesi, Mohammadreza ^{[1
]}

Kaesebier, Thomas ^{[2
]}

Elmanov, Ilia ^{[1
]}

Li, Yang-teng ^{[1
,3
]}

Kumar, Pawan ^{[1
]}

Geiss, Reinhard ^{[4
]}

Siefke, Thomas ^{[2
,4
]}

Eilenberger, Falk ^{[2
,4
]}

Setzpfandt, Frank ^{[1
,4
]}

Zeitner, Uwe ^{[4
,5
]}

Pertsch, Thomas ^{[1
,4
]}

机构：

[1] Friedrich Schiller Univ, Abbe Ctr Photon, Albert Einstein Str 6, D-07745 Jena, Germany

[2] Friedrich Schiller Univ, Inst Appl Phys, Albert Einstein Str 15, D-07745 Jena, Germany

[3] Genius Elect Opt, Keya E Rd, Taichung 428, Taiwan

[4] Fraunhofer Inst Appl Opt & Precis Engn IOF, Albert Einstein Str 7, D-07745 Jena, Germany

[5] Hsch Munchen, Dept Appl Sci & Mechatron, Lothstr 34, D-80335 Munich, Germany

来源：

OPTICAL MATERIALS EXPRESS | 2025年 / 15卷 / 02期

关键词：

THIN-FILM; RESONATORS;

D O I：

10.1364/OME.540146

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on the wafer scale fabrication of single-mode low-loss lithium niobate on insulator waveguides utilizing a chemically amplified resist and an optimized dry etching method. The fabricated single-mode waveguides are free of residuals and re-deposition, with measured losses for straight waveguides around 2 dB/m (0.02 dB/cm). We present a method offering advantages for large-scale production mainly due to its cost-effectiveness and faster writing time. This work holds promise for advancing integrated photonics and optical communication technologies.<br /> (c) 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement

引用

页码：299 / 306

页数：8

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