Wafer-scale low-loss lithium niobate photonic integrated circuits

被引：1

作者：

Luke, Kevin ^{[1
]}

Kharel, Prashanta ^{[1
]}

Reimer, Christian ^{[1
]}

He, Lingyan ^{[1
]}

Loncar, Marko ^{[2
]}

Zhang, Mian ^{[1
]}

机构：

[1] HyperLight, Cambridge, MA 02139 USA

[2] Harvard Univ, SEAS, Cambridge, MA 02138 USA

来源：

2020 IEEE PHOTONICS CONFERENCE (IPC) | 2020年

关键词：

D O I：

10.1109/ipc47351.2020.9252499

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

To date, monolithic thin-film lithium niobate photonic integrated circuits (LN PICs) have been limited to chipscale proof-of-concepts. We fabricate LN PICs on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching. We achieve 0.27 dB/cm optical propagation loss on wafer-scale.

引用

页数：2

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