Sulfur-Alloyed CuI for Highly Conducting and Stable p-Type Transparent Conductor via Scalable Iodination of Cu2S

被引:0
|
作者
Chen, Xiong Jing [1 ]
Liu, Gui Shan [1 ]
Fan, En Yao [1 ]
Duan, Qing Xing [2 ,3 ,4 ]
Li, Zhan Hua [5 ]
Deng, Bei [1 ]
Qi, Yuan Shen [2 ,3 ,4 ]
Yu, Kin Man [6 ]
Liu, Chao Ping [1 ]
机构
[1] Shantou Univ, Dept Phys, Shantou 515063, Guangdong, Peoples R China
[2] Guangdong Technion Israel Inst Technol, Dept Mat Sci & Engn, Shantou 515063, Guangdong, Peoples R China
[3] Guangdong Technion Israel Inst Technol, Guangdong Prov Key Lab Mat & Technol Energy Conver, Shantou 515063, Guangdong, Peoples R China
[4] Israel Inst Technol, Technion, Dept Mat Sci & Engn, IL-3200003 Haifa, Israel
[5] Nanjing Univ, Sch Elect Sci & Engn, Nanjing 210023, Peoples R China
[6] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
基金
中国国家自然科学基金;
关键词
FILMS;
D O I
10.1021/acs.jpcc.5c00604
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-performance p-type transparent conductors are crucial for next-generation optoelectronics but currently lag behind their n-type counterparts. Copper iodide (CuI), despite promising hole mobility, suffers from limited conductivity and stability. We address these limitations by reporting highly conducting and stable Cu-I-S thin films, fabricated via scalable solid iodination of sputtered Cu2S. Comprehensive characterization reveals that these S-alloyed CuI films primarily consist of polycrystalline zincblende S-incorporated CuI as the dominant phase, along with a minor amorphous Cu x S phase, exhibiting outstanding electrical properties: a remarkable hole concentration of similar to 3 x 1021 cm-3, a hole mobility of similar to 1 cm2 V-1 s-1, and a low resistivity of similar to 2 x 10-3 Omega<middle dot>cm, surpassing most p-type transparent conductors. These films demonstrate 50-70% visible transparency (with an optical bandgap of similar to 3.1 eV) and robust environmental stability. This enhanced conductivity and stability arise from S-alloying-induced copper vacancies within the S-incorporated CuI matrix, and notably within the Cu x S phase, which also significantly contributes to the improved stability. Post-thermal annealing of longer-iodinated Cu-I-S films increases copper sulfide content due to iodine out-diffusion at elevated temperatures, promoting copper and sulfur segregation. Our results also suggest a low concentration of sulfur substitution at iodine sites (SI) in the zincblende CuI phase under equilibrium growth conditions, consistent with the high formation energy of SI predicted by recent density functional theory calculations. These findings provide valuable insights into sulfur's role in modifying CuI properties to achieve superior electrical and optical performance along with excellent durability, making this scalable approach promising for advanced transparent electronic devices.
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页数:9
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