Coatings with both anti-reflective and photoluminescent properties for display substrates

被引：0
|
作者：
Huang, Jian Yong [1 ,2 ,3 ,4 ]
Liu, Yu Lei [1 ,4 ]
Liu, Chang Feng [1 ]
Li, Chao [1 ]
Li, Heng [1 ]
Han, Jie [1 ]
Feng, Yan [1 ]
机构：
[1] Hefei Lucky Sci & Technol Ind Co Ltd, Hefei 230041, Peoples R China
[2] Chinese Acad Sci, Hefei Inst Phys Sci, Inst Solid State Phys, Key Lab Mat Phys, POB 1129, Hefei 230031, Peoples R China
[3] Chinese Acad Sci, Inst Solid State Phys, Hefei Inst Phys Sci, Anhui Key Lab Nanomat & Nanotechnol, POB 1129, Hefei 230031, Peoples R China
[4] Univ Sci & Technol China, Hefei 230026, Peoples R China
来源：
OPTICAL MATERIALS | 2025年 / 160卷
关键词：
Anti-reflective coatings; Photoluminescence; Display; ZnO quantum dots; BROAD-BAND; TEREPHTHALATE SUBSTRATE; REFRACTIVE-INDEX; QUANTUM DOTS; SURFACE; EFFICIENCY; EMISSION; LAYER; PET;
D O I：
10.1016/j.optmat.2024.116631
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Reflected light from the display can seriously affect the quality of the display image. In addition, most of the light from the laser pointer passes directly through the display when it hits it, making it difficult to see the laser pointer's light spot. In this paper, ZnO quantum dots as photoluminescent materials were added into SiO2 sol to form a composite coating with photoluminescent and anti-reflective double properties. The composite coating can reduce the reflected light of display substrate from 11.4 % to 4.2 % in 400 similar to 780 nm band without annealing treatment. In addition, ZnO quantum dots absorb light up to 400 nm and emit visible light from 500 to 700 nm. When the 365 nm laser pointer illuminates a specific area of the sample, a bright yellow dot appears in that area.
引用
收藏
页数：8
相关论文
共 50 条
  • [31] Double layer anti-reflective coatings for silicon solar cells
    Wright, DN
    Marstein, ES
    Holt, A
    CONFERENCE RECORD OF THE THIRTY-FIRST IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2005, 2005, : 1237 - 1240
  • [32] Anti-Reflective Coatings for CRTs by Sol-Gel Process
    K. Abe
    Y. Sanada
    T. Morimoto
    Journal of Sol-Gel Science and Technology, 2001, 22 : 151 - 166
  • [33] Broadband anti-reflective coatings for cosmic microwave background experiments
    Nadolski, A.
    Kofman, A. M.
    Vieira, J. D.
    Ade, P. A. R.
    Ahmed, Z.
    Anderson, A. J.
    Avva, J. S.
    Thakur, R. Basu
    Bender, A. N.
    Benson, B. A.
    Carlstrom, J. E.
    Carter, F. W.
    Cecil, T. W.
    Chang, C. L.
    Cliche, J. F.
    Cukierman, A.
    de Haan, T.
    Ding, J.
    Dobbs, M. A.
    Dutcher, D.
    Everett, W.
    Foster, A.
    Fu, J.
    Gallicchio, J.
    Gilbert, A.
    Groh, J. C.
    Guns, S. T.
    Guyser, R.
    Halverson, N. W.
    Harke-Hosemann, A. H.
    Harrington, N. L.
    Henning, J. W.
    Holzapfel, W. L.
    Huang, N.
    Irwin, K. D.
    Jeong, O. B.
    Jonas, M.
    Jones, A.
    Khaire, T. S.
    Korman, M.
    Kubik, D. L.
    Kuhlmann, S.
    Kuo, C. -L.
    Lee, A. T.
    Lowitz, A. E.
    Meyer, S. S.
    Michalik, D.
    Montgomery, J.
    Natoli, T.
    Nguyen, H.
    MILLIMETER, SUBMILLIMETER, AND FAR-INFRARED DETECTORS AND INSTRUMENTATION FOR ASTRONOMY IX, 2018, 10708
  • [34] Anti-reflective coatings for CRTs by sol-gel process
    Abe, K
    Sanada, Y
    Morimoto, T
    JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 2003, 26 (1-3) : 709 - 713
  • [35] Advancements in organic anti-reflective coatings for Dual Damascene processes
    Deshpande, S
    Shao, X
    Lamb, J
    Brakensiek, N
    Johnson, J
    Wu, XM
    Xu, G
    Simmons, B
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 797 - 805
  • [36] Organic ArF bottom anti-reflective coatings for immersion lithography
    Xiang, Zhong
    Zhuang, Hong
    Wu, Hengpeng
    Shan, Jianhui
    Abdallah, Dave
    Yin, Jian
    Mullen, Salem
    Yao, Huirong
    Gonzalez, Eleazar
    Neisser, Mark
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
  • [37] Anti-Reflective Coatings for CRTs by Sol-Gel Process
    K. Abe
    Y. Sanada
    T. Morimoto
    Journal of Sol-Gel Science and Technology, 2003, 26 : 709 - 713
  • [38] UV-blocking ZnO nanostructure anti-reflective coatings
    Du, Qing Guo
    Alagappan, G.
    Dai, Haitao
    Demir, H. V.
    Yu, H. Y.
    Sun, Xiao Wei
    Kam, Chan Hin
    OPTICS COMMUNICATIONS, 2012, 285 (13-14) : 3238 - 3241
  • [39] Anti-reflective coatings by APCVD using graded index layers
    Neuman, G.A.
    Journal of Non-Crystalline Solids, 1997, 218 : 92 - 99
  • [40] Compatibility of chemically amplified photoresists with bottom anti-reflective coatings
    Yoshino, H
    Itani, T
    Hashimoto, S
    Yamana, M
    Yoshii, T
    Tanabe, H
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2, 1998, 3333 : 655 - 665
12345