Modifying the Complex Refractive Index of Thin-Films for Nanooptical Applications

被引：0

作者：

Kuenne, Marco ^{[1
]}

Kusserow, Thomas ^{[2
,3
]}

Witzigmann, Bernd ^{[2
]}

Hillmer, Hartmut ^{[3
,4
]}

机构：

[1] Univ Kassel, Measurement Technol Grp, Elect Engn & Comp Sci, Kassel, Germany

[2] Friedrich Alexander Univ Erlangen Nurnberg, Inst Optoelect, Dept EEI, Erlangen, Germany

[3] Univ Kassel, Technol Elect, Inst Nanostruct Technol & Analyt INA, Kassel, Germany

[4] Univ Kassel, Ctr Interdisciplinary Nanostruct Sci & Technol CI, Kassel, Germany

来源：

2024 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS, OMN | 2024年

关键词：

nanooptics; material modification; complex refractive index; ITO; ZrN; TiN;

D O I：

10.1109/OMN61224.2024.10685281

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a method to generate 2D refractive index patterns in thin-films for nanooptical applications, like metasurfaces and plasmonics. The method is based on standard deposition, lithography and manipulation processes and can be applied to numerous material systems. Examples for modification of indium tin oxide and transition metal nitride layers are given.

引用

页数：2

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