Passivation of acceptors in GaN by hydrogen and their activation

被引:0
|
作者
Reshchikov, M. A. [1 ]
Andrieiev, O. [1 ]
Vorobiov, M. [1 ]
Ye, D. [1 ]
Demchenko, D. O. [1 ]
Mcewen, B. [2 ]
Shahedipour-Sandvik, F. [2 ]
机构
[1] Virginia Commonwealth Univ, Dept Phys, Richmond, VA 23220 USA
[2] SUNY Albany, Dept Nanoscale Sci & Engn, Albany, NY 12203 USA
基金
美国国家科学基金会;
关键词
photoluminescence; GaN; passivation; point defects; thermal annealing; semiconductors; MG; DIFFUSION; COMPLEX;
D O I
10.1088/1361-6528/ada298
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
GaN is an important semiconductor for energy-efficient light-emitting devices. Hydrogen plays a crucial role in gallium nitride (GaN) growth and processing. It can form electrically neutral complexes with acceptors during growth, which significantly increases the acceptor incorporation. Post-growth annealing dissociates these complexes and is widely utilized for activating Mg acceptors and achieving conductive p-type GaN. In this work, we demonstrate that other acceptors, such as C and Be, also form complexes with hydrogen similar to Mg. The effect of thermal annealing of GaN on photoluminescence (PL) was investigated. In samples moderately doped with Be, the Be-Ga-related yellow luminescence (YLBe) band intensity decreased by up to an order of magnitude after annealing in N-2 ambient at temperatures T-ann = 400 degrees C-900 degrees C. This was explained by the release of hydrogen from unknown traps and the passivation of the Be-Ga acceptors. A similar drop of PL intensity at T-ann = 350 degrees C-900 degrees C was observed for the C-N-related YL1 band in unintentionally C-doped GaN and also attributed to passivation of the C-N acceptors by hydrogen released from unknown defects. In this case, the formation of the CNHi complexes was confirmed by the observation of the rising BL2 band associated with these complexes. At T-ann > 900 degrees C, both the YLBe and YL1 intensities were restored, which was explained by the removal of hydrogen from the samples. Experimental results were compared to the first principles calculations of complex dissociation and hydrogen diffusion paths in GaN.
引用
收藏
页数:11
相关论文
共 50 条
  • [41] ATOMIC-HYDROGEN PASSIVATION OF DONORS AND ACCEPTORS IN TERNARY AND QUATERNARY SOLUTIONS OF THE INGAASP SYSTEM
    OMELYANOVSKII, EM
    PAKHOMOV, AV
    POLYAKOV, AY
    SHEPEKINA, GV
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1989, 23 (09): : 1059 - 1060
  • [42] Hydrogen in silicon and germanium: Impurity activation and dopant passivation
    Haller, EE
    AMORPHOUS AND NANOCRYSTALLINE SILICON SCIENCE AND TECHNOLOGY- 2004, 2004, 808 : 73 - 84
  • [43] Hydrogen in silicon and germanium: Impurity activation and dopant passivation
    Haller, EE
    HYDROGEN IN SEMICONDUCTORS, 2004, 813 : 3 - 14
  • [44] Shallow acceptors in GaN
    Eberlein, T. A. G.
    Jones, R.
    Oberg, S.
    Briddon, P. R.
    APPLIED PHYSICS LETTERS, 2007, 91 (13)
  • [45] Activation of group-I acceptors by hydrogen codoping in ZnO
    Lee, EC
    Chang, KJ
    COMPOUND SEMICONDUCTORS 2004, PROCEEDINGS, 2005, 184 : 317 - 320
  • [46] Investigation of thermal annealing processes on the activation of Mg acceptors and the structural quality of GaN
    Schineller, B
    Guttzeit, A
    Schon, O
    Heuken, M
    Heime, K
    Beccard, R
    SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 1397 - 1400
  • [47] Hydrogen passivation of boron acceptors in as-grown boron-doped CVD diamond epilayers
    Fernandez-Lorenzo, C.
    Araujo, D.
    Martin, J.
    Alcantara, R.
    Navas, J.
    Villar, M. P.
    Alegre, M. P.
    Volpe, P. N.
    Omnes, F.
    Bustarret, E.
    DIAMOND AND RELATED MATERIALS, 2010, 19 (7-9) : 904 - 907
  • [48] HYDROGEN PASSIVATION OF CD-ACCEPTORS IN III-V-SEMICONDUCTORS STUDIED BY PAC SPECTROSCOPY
    FORKELWIRTH, D
    ACHTZIGER, N
    BURCHARD, A
    CORREIA, JC
    DEICHER, M
    LICHT, T
    MAGERLE, R
    MARQUES, JG
    MEIER, J
    PFEIFFER, W
    REISLOHNER, U
    RUB, M
    TOULEMONDE, M
    WITTHUHN, W
    SOLID STATE COMMUNICATIONS, 1995, 93 (05) : 425 - 430
  • [49] Hydrogen passivation of the n-GaN nanowire/p-Si heterointerface
    Shugurov, K. Yu
    Mozharov, A. M.
    Bolshakov, A. D.
    Fedorov, V. V.
    Sapunov, G. A.
    Shtrom, I., V
    Uvarov, A., V
    Kudryashov, D. A.
    Baranov, A., I
    Mikhailovskii, V. Yu
    Neplokh, V. V.
    Tchernycheva, M.
    Cirlin, G. E.
    Mukhin, I. S.
    NANOTECHNOLOGY, 2020, 31 (24)
  • [50] First-principles calculation on hydrogen passivation mechanism in Mg doped GaN
    Okamoto, Y
    Saito, M
    Oshiyama, A
    ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4, 1995, 196-2 : 981 - 985