Selection of Conditions for the Synthesis of Methacrylate Monomers Based on Adamantane

被引:0
|
作者
Novikov, Alexander S. [1 ]
Malkov, Georgiy V. [1 ]
Akkuratov, Alexander V. [1 ]
机构
[1] RAS, Fed Res Ctr Problems Chem Phys & Med Chem, Chernogolovka 142432, Moscow Region, Russia
关键词
DUV photolithography; photoresist monomers; adamantyl methacrylates; reaction conditions; DABCO; acylation; POLYMERS;
D O I
10.1055/a-2421-3288
中图分类号
O62 [有机化学];
学科分类号
070303 ; 081704 ;
摘要
Adamantane-based methacrylates are important monomers for the design of polymers used for the development of chemically amplified photoresists. Herein, we present the selection of reaction conditions for obtaining of 2-ethyladamantan-2-yl methacrylate, 2-methyladamantan-2-yl methacrylate, adamantan-1-yl methacrylate, and 3-hydroxyadamantan-1-yl methacrylate from adamantane derivatives and methacryloyl chloride. It is shown that the combination of pyridine as a solvent and base with 1,4-diazabicyclo[2.2.2]octane (DABCO) as a base allows reproducible preparation of the desired products with good yields. The results obtained provide valuable information for upscaling the synthesis of important products for the microelectronics industry.
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页数:4
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