Hybrid functionals evaluate the n-type defects in Nb, Mo and Pt doped α-Ga2 O3
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作者:
Chang, Jinyan
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China Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R ChinaChina Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
Chang, Jinyan
[1
]
Yang, Liu
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China Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R ChinaChina Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
Yang, Liu
[1
]
Hu, Gongwei
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China Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R ChinaChina Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
Hu, Gongwei
[1
]
Fan, Shuaiwei
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China Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
China Three Gorges Univ, Hubei Engn Res Ctr Weak Magnet Field Detect, Yichang 443002, Peoples R ChinaChina Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
Fan, Shuaiwei
[1
,2
]
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[1] China Three Gorges Univ, Dept Phys, Yichang 443002, Peoples R China
[2] China Three Gorges Univ, Hubei Engn Res Ctr Weak Magnet Field Detect, Yichang 443002, Peoples R China
Based on the hybrid functionals calculations, the efficiency of the n-type defects Nb, Mo and Pt substituting Ga (labeled as NbGa, MoGa and PtGa) in alpha-Ga2O3 are fully evaluated. Obtained phonon dispersions imply the alpha-Ga2O3 containing NbGa, MoGa and PtGa defects keep the thermodynamic stability. The NbGa, MoGa and PtGa are typical ntype defects. The transition energy levels s(0/+) show defects NbGa, MoGa and PtGa in alpha-Ga2O3 could be fully ionized. With the thermodynamic equilibrium fabrication scheme, we find NbO, MoO3 and PtO2 are the optimal dopants sources, and the minimum formation energies for defects NbGa, MoGa and PtGa are -0.66 eV, 2.56 eV and 3.21 eV. Meanwhile, MoGa (PtGa) with intrinsic defect VO is highly susceptible to form defect complex VO + MoGa (VO + PtGa). These findings would provide significant insights to the n-type defects in alpha-Ga2O3.
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Aalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Univ Helsinki, Dept Phys, POB 43, FI-00014 Helsinki, Finland
Univ Helsinki, Helsinki Inst Phys, POB 43, FI-00014 Helsinki, FinlandAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Karjalainen, A.
Makkonen, I.
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Univ Helsinki, Dept Phys, POB 43, FI-00014 Helsinki, Finland
Univ Helsinki, Helsinki Inst Phys, POB 43, FI-00014 Helsinki, FinlandAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Makkonen, I.
Etula, J.
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Aalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, FinlandAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Etula, J.
Goto, K.
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Tokyo Univ Agr & Technol, Dept Appl Chem, 2-24-16 Naka Cho, Koganei, Tokyo, JapanAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Goto, K.
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Murakami, H.
Kumagai, Y.
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Tokyo Univ Agr & Technol, Dept Appl Chem, 2-24-16 Naka Cho, Koganei, Tokyo, JapanAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Kumagai, Y.
Tuomisto, F.
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Aalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
Univ Helsinki, Dept Phys, POB 43, FI-00014 Helsinki, Finland
Univ Helsinki, Helsinki Inst Phys, POB 43, FI-00014 Helsinki, FinlandAalto Univ, Dept Appl Phys, POB 15100, FI-00076 Espoo, Finland
机构:
Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Sai, Qinglin
Cui, Huiyuan
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Shanghai Microwave Technol Res Inst, Shanghai 200063, Peoples R ChinaChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Cui, Huiyuan
Xia, Changtai
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Xia, Changtai
Qi, Hongji
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Hangzhou Inst Opt & Fine Mech, Hangzhou 311400, Peoples R ChinaChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Qi, Hongji
Pan, Mingyan
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Pan, Mingyan
Ahmed, A. M.
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Sohag Univ, Fac Sci, Phys Dept, Sohag 82524, EgyptChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Ahmed, A. M.
Mohamed, H. F.
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Sohag Univ, Fac Sci, Phys Dept, Sohag 82524, EgyptChinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
机构:
Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, JapanUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Traore, Aboulaye
Gouveia, Maria
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Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Univ Grenoble Alpes, F-38400 Grenoble, FranceUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Gouveia, Maria
Okumura, Hironori
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Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, JapanUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Okumura, Hironori
Mannequin, Cedric
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Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, JapanUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Mannequin, Cedric
Fassion, Andrea
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Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Univ Grenoble Alpes, F-38400 Grenoble, FranceUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan
Fassion, Andrea
Sakurai, Takeaki
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Univ Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, JapanUniv Tsukuba, Fac Pure & Appl Sci, Tsukuba, Ibaraki 3058571, Japan