Research progress on irradiation effect of InP-based high electron mobility transistors

被引:0
|
作者
Fang, Renfeng [1 ]
Zhou, Shuxing [1 ]
Cao, Wenyu [1 ]
Wei, Yanfeng [1 ]
Wang, Jingyang [1 ]
Li, Shusen [2 ]
Yan, Jiasheng [2 ]
Liang, Guijie [1 ]
机构
[1] Hubei Key Laboratory of Low Dimensional Optoelectronic Materials and Devices, Hubei University of Arts and Science, Xiangyang,441053, China
[2] Hubei Key Laboratory of High Power Semiconductor Technology, Hubei Tech Semiconductor Co., Ltd, Xiangyang,441021, China
来源
He Jishu/Nuclear Techniques | 2025年 / 48卷 / 01期
基金
中国国家自然科学基金;
关键词
Electron irradiation - High electron mobility transistors - Radiation damage - Radiation hardening - Radio waves - Satellite communication systems - Semiconducting indium phosphide - Strain hardening;
D O I
10.11889/j.0253-3219.2025.hjs.48.230127
中图分类号
学科分类号
摘要
Indium phosphide (InP)-based high electron mobility transistors (HEMTs) have been widely adopted in space communication systems such as satellites, manned spaceflight, and deep space exploration due to their high frequency and gain, and low noise. However, high-energy particles such as protons, electrons, and neutrons in a space environment affect the performance of InP-based HEMTs and reduce the reliability of space communication systems. This paper mainly discusses the influence and degradation mechanism of defects induced by high-energy particle irradiation on the direct current (DC) and radio frequency (RF) performance of InP-based HEMTs, as well as the transconductance and kink effect in the irradiation environment. Subsequently, the research progress of radiation-hardening measures for InP-based HEMT devices is summarized and analyzed so as to provide the theoretical guidance for studying damage mechanism of InP based HEMT irradiation effect and improving its radiation-hardening technology. Finally, based on current challenges in the field, future research directions are proposed for radiation effects and radiation-hardening technologies of InP-based HEMTs. © 2025 Science Press. All rights reserved.
引用
收藏
相关论文
共 50 条
  • [21] Influence of hole accumulation on source resistance, kink effect and on-state breakdown of InP-based high electron mobility transistors: Light irradiation study
    Suemitsu, T
    Fushimi, H
    Kodama, S
    Tsunashima, S
    Kimura, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (2B): : 1104 - 1107
  • [22] Effect of Gate-Recess Structure on Electron Transport in InP-Based High Electron Mobility Transistors Studied by Monte Carlo Simulations
    Endoh, Akira
    Watanabe, Issei
    Mimura, Takashi
    Matsui, Toshiaki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (10)
  • [23] Optical characterization of impact ionization in flip-chip-bonded InP-based high electron mobility transistors
    Shigekawa, N
    Furuta, T
    Suemitsu, T
    Umeda, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (10): : 5823 - 5828
  • [24] Optical characterization of impact ionization in flip-chip-bonded InP-based high electron mobility transistors
    Shigekawa, Naotem
    Furuta, Tomofumi
    Suemitsu, Tetsuya
    Umeda, Yohtaro
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (10): : 5823 - 5828
  • [25] Microwave noise characteristics of InP-based high electron mobility transistors with InGaAs channel and InGaAs/InP composite channel: A comparative study
    Liu, YW
    Wang, H
    Zeng, R
    2005 International Conference on Indium Phosphide and Related Materials, 2005, : 437 - 439
  • [26] Simple and high-precision asymmetric gate-recess process for ultrafast InP-based high electron mobility transistors
    Shinohara, K
    Matsui, T
    Yamashita, Y
    Endoh, A
    Hikosaka, K
    Mimura, T
    Hiyamizu, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05): : 2096 - 2100
  • [27] Fabrication technology and device performance of sub-50-nm-gate InP-based high electron mobility transistors
    Endoh, A
    Yamashita, Y
    Shinohara, K
    Higashiwaki, M
    Hikosaka, K
    Mimura, T
    Hiyamizu, S
    Matsui, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (2B): : 1094 - 1098
  • [28] Fabrication technology and device performance of sub-50-nm-gate InP-based high electron mobility transistors
    Endoh, Akira
    Yamashita, Yoshimi
    Shinohara, Keisuke
    Higashiwaki, Masataka
    Hikosaka, Kohki
    Mimura, Takashi
    Hiyamizu, Satoshi
    Matsui, Toshiaki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (2 B): : 1094 - 1098
  • [29] Thermal stability of InP-based high electron mobility transistor epitaxial wafers
    Sugiyama, H
    Watanabe, K
    Yokoyama, H
    Kobayashi, T
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (07) : 4260 - 4267
  • [30] High speed InP-based heterojunction bipolar transistors
    Rodwell, M
    Urteaga, M
    Lee, S
    Scott, D
    Kim, YM
    Dahlstrom, M
    Wei, Y
    Mathew, T
    Long, S
    Gossard, A
    COMPOUND SEMICONDUCTORS 2001, 2002, (170): : 21 - 26