A GaN-on-SiC Millimeter-Wave Low Noise Amplifier Using Hybrid-Matching Technique for 5G n258 Applications

被引:0
|
作者
Lan, Liang [1 ,2 ]
Zhang, Zhihao [1 ]
Huang, Chaoyu [1 ]
Zhang, Gary [1 ]
机构
[1] Guangdong Univ Technol, Sch Integrated Circuits, Guangzhou, Peoples R China
[2] Guangdong Univ Technol, Sch Informat Engn, Guangzhou, Peoples R China
基金
国家重点研发计划;
关键词
gallium nitride on silicon carbide; high electron mobility transistor; hybrid matching technique; low noise amplifier; millimeter-wave;
D O I
10.1002/mop.70031
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter details the design and implementation of a millimeter-wave (mm-Wave) low noise amplifier (LNA) employing 150-nm gallium nitride on silicon carbide (GaN-on-SiC) high electron mobility transistor technology, specifically tailored for fifth-generation (5G) applications. The proposed GaN-based LNA integrates a hybrid matching topology alongside a co-design strategy, thereby optimizing the noise figure (NF) by minimizing interstage matching components. The fabricated LNA, spanning a total chip area of 2.3 x 1.4 mm(2), exhibits a linear gain in the range of 17.41-19.2 dB and maintains an NF within 2.32-3.06 dB. Additionally, commendable input/output return losses exceeding 7.5 dB are achieved across the 23-27.5 GHz, with the apparatus consuming approximately 150 mW.
引用
收藏
页数:6
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