Mechanisms of alignment of lamellar-forming block copolymer under shear flow

被引:0
|
作者
Pinna, Marco [1 ]
Diaz, Javier [2 ,3 ]
Denison, Christopher [1 ]
Zvelindovsky, Andrei [1 ]
Pagonabarraga, Ignacio [2 ,3 ]
机构
[1] Univ Lincoln, Coll Hlth & Sci, Ctr Computat Phys, Sch Math & Phys, Lincoln LN6 7TS, England
[2] Univ Barcelona, Dept Fis Mat Condensada, Marti & Franques 1, 08028 Barcelona, Spain
[3] Univ Barcelona, Univ Barcelona Inst Complex Syst UBICS, Barcelona 08028, Spain
关键词
CELL-DYNAMICS SIMULATIONS; THIN-FILMS; DIBLOCK COPOLYMERS; PHASE-TRANSITIONS; ELECTRIC-FIELD; MORPHOLOGY; SEPARATION; STABILITY; MELT;
D O I
10.1039/d4sm01241k
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The potential applications of block copolymer thin films, utilising their self-assembly capabilities, are enhanced when achieving long-range ordering. In this study we explain the experimental alignment of lamellae under shear flow findings [S. Pujari et al. Soft Matter, 2012, 8, 5258] and classify the alignment mechanisms based on shear rate and segregation, uncovering similarities to the systems subjected to electric fields, suggesting a common pathway of lamellae orientations. However, the presence of thin films surfaces introduces distinct features in the lamellae orientation under shear compared to electric fields. Notably, we observe the emergence of a three-dimensional rotation alongside the conventional two-dimensional rotation. Furthermore, a transient regime has been identified within the melting mechanism, which confirms the existence of the checkboard pattern proposed by Schneider et al. [Macromolecules, 2018, 51, 4642]. These findings significantly enhance our understanding of block copolymer alignments and shed light on the intricate interplay between external fields and the lamellar structure.
引用
收藏
页码:476 / 487
页数:12
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