Low-temperature fabrication of amorphous carbon films as a universal template for remote epitaxy

被引：0
|
作者：
Henksmeier, T. [1 ,2 ]
Mahler, P. [1 ]
Wolff, A. [1 ]
Deutsch, D. [1 ]
Voigt, M. [3 ]
Ruhm, L. [3 ]
Sanchez, A.M. [4 ]
As, D.J. [1 ]
Grundmeier, G. [3 ]
Reuter, D. [1 ,2 ]
机构：
[1] Department of Physics and Center for Optoelectronics and Photonics Paderborn (CeOPP), Paderborn University, Paderborn, Germany
[2] Institute for Photonic Quantum Systems (PhoQS), Paderborn University, Paderborn, Germany
[3] Department of Chemistry, Paderborn University, Paderborn, Germany
[4] Department of Physics, Warwick University, Coventry, United Kingdom
来源：
Communications Materials | 2024年 / 5卷 / 01期
关键词：
Compendex;
D O I：
10.1038/s43246-024-00718-7
中图分类号：
学科分类号：
摘要：
III-V semiconductors
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