Structural Insights and hydrogen retention in amorphous and crystalline tungsten oxide films

被引:0
|
作者
Zavasnik, Janez [1 ,3 ]
Shvalya, Vasyl [1 ,2 ]
Kremer, Kristof [4 ]
Schwarz-Selinger, Thomas [4 ]
Jacob, Wolfgang [4 ]
机构
[1] Jozef Stefan Inst, Jamova Cesta 39, Ljubljana 1000, Slovenia
[2] Jozef Stefan Int Postgrad Sch, Jamova Cesta 39, Ljubljana 1000, Slovenia
[3] Max Planck Inst Nachhaltige Mat, Max Planck Str 1 4, D-40237 Dusseldorf, Germany
[4] Max Planck Inst Plasma Phys, Boltzmannstr 2, D-85748 Munich, Germany
关键词
Tungsten oxide; Thin films; Hydrogen isotopes; Deuterium uptake; Crystal structure; NUCLEAR-REACTION; HEAT-TREATMENT; DEPENDENCE; DEUTERIUM; OXIDATION;
D O I
10.1016/j.apsusc.2025.162712
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigated structural characteristics of and hydrogen isotope interactions with thermally and electrochemically synthesized tungsten oxide (W-oxide) thin films (<= 50 nm). Specifically, we assessed whether electrochemically synthesized W-oxide could serve as a suitable proxy for thermally grown films in hydrogen interaction studies. The W-oxide thin films were exposed to low-energetic atomic deuterium (D) to explore the hydrogen uptake, retention, and intercalation effects of the W-oxide structure. The W-oxides were characterized using grazing incidence X-ray diffraction (GI-XRD), scanning and transmission electron microscopy (SEM, TEM), Raman spectroscopy, and Fourier-transform infrared spectroscopy (FTIR) before and after deuterium exposure. The thermally grown W-oxides are crystalline, composed of orthorhombic WO3, while the electrochemically grown W-oxides are amorphous with nanocrystalline domains. Deuterium retention studies revealed that the electrochemically grown W-oxides show higher initial D retention compared with their thermally grown counterparts and lower D release over time during storage, suggesting stronger D binding within the amorphous matrix. Using ion beam analysis, we quantified the deuterium retention and examined the depth-resolved reduction of the oxide within the films following deuterium exposure.
引用
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页数:10
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