Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

被引：0
|
作者：
Ding, Huwen [1 ,2 ,3 ]
Dong, Lisong [1 ,2 ,3 ]
Li, Ziqi [1 ,2 ]
He, Jianfang [1 ,2 ,3 ]
Ma, Le [1 ,2 ,3 ]
Rui, Dinghai [1 ,2 ]
Wei, Yayi [1 ,2 ,3 ]
机构：
[1] EDA Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing,100029, China
[2] School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing,101408, China
[3] Guangdong Greater Bay Area Applied Research Institute of Integrated Circuit and Systems, Guangzhou,510700, China
来源：
Applied Optics | 2024年 / 63卷 / 32期
关键词：
D O I：
10.1364/AO.533329
中图分类号：
学科分类号：
摘要：
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页码：8454 / 8464
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