共 50 条
- [31] Data feed-forward for improved optical CD and film metrology METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2, 2012, 8324
- [32] Improved CD and overlay metrology using an optical Fourier transform instrument METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIX, PTS 1-3, 2005, 5752 : 420 - 428
- [35] Metrology requirements for lithography's next wave METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 : 1 - 9
- [36] Actinic mask metrology for extreme ultraviolet lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (01): : 264 - 267