Structural and dielectric properties of Ba(Ti1-xSnx)O3 thin films

被引：0
|
作者：
Tsukuda, M. [1 ]
Mukaida, M. [1 ]
Miyazawa, Sh. [1 ]
机构：
[1] NTT LSI Lab, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 9 B期
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摘要：
12
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页码：4908 / 4912
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