DEPOSITION KINETICS OF SILICON THIN FILMS BY PLASMA CVD.

被引:0
|
作者
Matsuda, Akihisa
机构
来源
| 1600年
关键词
D O I
暂无
中图分类号
学科分类号
摘要
SILICON AND ALLOYS
引用
收藏
相关论文
共 50 条
  • [31] Low-temperature deposition of SiCN thin films by RF plasma CVD method
    Kumadaki, Masahiko
    Yoshino, Masaki
    Sato, Kohki
    Itoh, Hidenori
    IEEJ Transactions on Fundamentals and Materials, 2014, 134 (10) : 538 - 544
  • [32] Deposition of tungsten thin films by dual frequency inductively coupled plasma assisted CVD
    Colpo, P
    Rossi, F
    Gibson, N
    Gilliland, D
    THIN SOLID FILMS, 1998, 332 (1-2) : 21 - 24
  • [33] Deposition process of metal oxide thin films by means of plasma CVD with β-diketonates as precursors
    Itoh, K
    Matsumoto, O
    THIN SOLID FILMS, 1999, 345 (01) : 29 - 33
  • [34] Plasma enhanced deposition of silicon carbonitride thin films and property characterization
    Cao, ZX
    DIAMOND AND RELATED MATERIALS, 2002, 11 (01) : 16 - 21
  • [35] FABRICATION OF a-Si:H FILMS BY COAXIAL LINE TYPE MICROWAVE HYDROGEN PLASMA CVD.
    Kato, Isamu
    Ueda, Tetsuya
    Hatanaka, Kazuhisa
    Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1987, 70 (11): : 73 - 84
  • [36] PLASMA DEPOSITION AND CHARACTERIZATION OF THIN SILICON-RICH SILICON-NITRIDE FILMS
    NGUYEN, SV
    FRIDMANN, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (09) : 2324 - 2329
  • [37] PLASMA DEPOSITION AND CHARACTERIZATION OF THIN SILICON-RICH SILICON NITRIDE FILMS.
    Nguyen, S.V.
    Fridmann, S.
    Journal of the Electrochemical Society, 1987, l34 (09) : 2324 - 2329
  • [38] DIRECT WRITING OF SILICON LINES BY PYROLYTIC ARGON LASER CVD.
    Ishizu, Akira
    Inoue, Yasuo
    Nishimura, Tadashi
    Akasaka, Yoichi
    Miki, Hidejiro
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1986, 25 (12): : 1830 - 1833
  • [39] THERMAL ANNEALING OF PLASMA CVD SILICON FILMS
    AOYAMA, T
    ADACHI, E
    KONISHI, N
    SUZUKI, T
    MIYATA, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) : 2049 - 2051
  • [40] Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD
    Watrin, Lise
    Silva, Francois
    Jadaud, Cyril
    Bulkin, Pavel
    Vanel, Jean-Charles
    Muller, Dominique
    Johnson, Erik, V
    Ouaras, Karim
    Cabarrocas, Pere Roca, I
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2024, 57 (31)