Oxidation behavior of Ta thin films as a passivation layer deposited on Cu

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作者：
Ichikawa, Takaaki [1 ]
Takeyama, Mayumi [1 ]
Noya, Atsushi [1 ]
机构：
[1] Kitami Inst of Technology, Kitami, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 03期
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页码：1844 / 1845
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