共 50 条
- [33] Role of ion energy flux on the structural and morphological properties of silicon oxy-nitride composite films deposited by plasma focus device RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2018, 173 (11-12): : 929 - 943
- [35] Photolytic deposition of aluminum nitride and oxy-nitride films at temperatures &le 350 K J Electron Mater, 1 (69-74):
- [37] REACTIVELY SPUTTERED SILICON OXY-NITRIDE FILMS FOR SOLAR-ABSORBER ANTI-REFLECTION COATINGS SOLAR ENERGY MATERIALS, 1984, 10 (01): : 9 - 24
- [40] Stress development kinetics in plasma-enhanced chemical-vapor-deposited silicon nitride films Journal of Applied Physics, 2005, 97 (11):