Deep interface states in SiO2/p-type α-SiC structure

被引:0
|
作者
Inoue, Naoya [1 ]
Kimoto, Tsunenobu [1 ]
Yano, Hiroshi [1 ]
Matsunami, Hiroyuki [1 ]
机构
[1] Kyoto Univ, Kyoto, Japan
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] ELECTRICAL AND PHYSICOCHEMICAL CHARACTERIZATIONS OF THE SIO2/SIC INTERFACE
    BILLON, T
    BANO, E
    DICIOCCIO, L
    OUISSE, T
    LASSAGNE, P
    JAUSSAUD, C
    MICROELECTRONIC ENGINEERING, 1995, 28 (1-4) : 193 - 196
  • [42] SiO2/SiC interface proved by positron annihilation
    Maekawa, A
    Kawasuso, A
    Yoshikawa, A
    Itoh, H
    APPLIED SURFACE SCIENCE, 2003, 216 (1-4) : 365 - 370
  • [43] The role of oxygen and nitrogen at the SiO2/SiC interface
    Golz, A
    Scharnholz, S
    Kurz, H
    MICROELECTRONIC ENGINEERING, 1997, 36 (1-4) : 187 - 190
  • [44] Characterization of the SiO2/SiC Interface with Impedance Spectroscopy
    Sobas, Pawel A.
    Grossner, Ulrike
    Svensson, Bengt G.
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 501 - 504
  • [45] Optically Active Defects at the SiC/SiO2 Interface
    Johnson, B. C.
    Woerle, J.
    Haasmann, D.
    Lew, C. T-K
    Parker, R. A.
    Knowles, H.
    Pingault, B.
    Atature, M.
    Gali, A.
    Dimitrijev, S.
    Camarda, M.
    McCallum, J. C.
    PHYSICAL REVIEW APPLIED, 2019, 12 (04)
  • [46] EVALUATION OF SURFACE STATES AT SI-SIO2 INTERFACE FROM CHARACTERISTICS OF P-TYPE MOS DIODES
    HORIUCHI, S
    YAMAGUCH.J
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, 4 (08) : 613 - &
  • [47] Silicon oxycarbide formation on SiC surfaces and at the SiC/SiO2 interface
    Onneby, C.
    Pantano, C.G.
    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997, 15 (03): : 1597 - 1602
  • [48] ESR characterization of SiC bulk crystals and SiO2/SiC interface
    Isoya, J
    Kosugi, R
    Fukuda, K
    Yamasaki, S
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1025 - 1028
  • [50] Silicon oxycarbide formation on SiC surfaces and at the SiC/SiO2 interface
    Onneby, C
    Pantano, CG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (03): : 1597 - 1602