Environmentally Friendly Polysilane Photoresists

被引:0
|
作者
Beach, J. V.
Loy, D. A.
Hsiao, Y.-L.
Waymouth, R. M.
机构
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Environmentally friendly polysilane photoresists
    Beach, JV
    Loy, DA
    Hsiao, YL
    Waymouth, RM
    MICROELECTRONICS TECHNOLOGY: POLYMERS FOR ADVANCED IMAGING AND PACKAGING, 1995, 614 : 355 - 366
  • [2] ENVIRONMENTALLY FRIENDLY POLYSILANES - AN ALTERNATIVE ROUTE TO POLYSILANE PHOTORESISTS
    BEACH, JV
    LOY, DA
    HSIAO, YL
    WAYMOUTH, RM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 121 - PMSE
  • [3] ENVIRONMENTALLY BENIGN POLYMER SYNTHESIS - POLYSILANE PHOTORESISTS
    HSIAO, YL
    WAYMOUTH, RM
    BEACH, JV
    LOY, DA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 127 - ORGN
  • [4] Patterning Conventional Photoresists in Environmentally Friendly Silicone Fluids
    Ouyang, Christine Y.
    Lee, Jin-Kyun
    Krysak, Marie
    Ober, Christopher K.
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, 2011, 7972
  • [5] Environmentally Friendly Processing of Photoresists in scCO2 and Decamethyltetrasiloxane
    Ouyang, Christine Y.
    Lee, Jin-Kyun
    Sha, Jing
    Ober, Christopher K.
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2, 2010, 7639
  • [6] Negative-tone development of photoresists in environmentally friendly silicone fluids
    Ouyang, Christine Y.
    Lee, Jin-Kyun
    Ober, Christopher K.
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX, 2012, 8325
  • [7] Environmentally friendly development of conventional polymeric photoresists using nonpolar silicone fluids
    Ouyang, Christine Y.
    Lee, Jin-Kyun
    Krysak, Marie E.
    Ober, Christopher K.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2011, 241
  • [8] Towards environmentally friendly, dry deposited, water developable molecular glass photoresists
    Pfeiffer, Frauke
    Felix, Nelson M.
    Neuber, Christian
    Ober, Christopher K.
    Schmidt, Hans-Werner
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2008, 10 (09) : 1257 - 1262
  • [9] Synthesis, photo and pyrolytic properties of polysilane photoresists
    Ekhorutomwen, SA
    Sawan, SP
    SILICON-BASED OPTOELECTRONICS II, 2000, 3953 : 150 - 162
  • [10] Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists
    Yamada, S
    Mrozek, T
    Rager, T
    Owens, J
    Rangel, J
    Willson, CG
    Byers, J
    MACROMOLECULES, 2004, 37 (02) : 377 - 384