THERMAL-WAVE MEASUREMENTS OF ION IMPLANTED SILICON.

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作者：
Kirby, Bradford J. [1 ]
Larson, Lawrence A. [1 ]
Liang, Ru-Yu [1 ]
机构：
[1] Natl Semiconductor Corp, Santa, Clara, CA, USA, Natl Semiconductor Corp, Santa Clara, CA, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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8
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页码：550 / 553
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