Method for angular sputter yield extraction for high-density plasma chemical vapor deposition simulators

被引：0
|
作者：
机构：
来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1998年 / 16卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Experimental study of nanoparticle generation during high-density plasma chemical vapor deposition of poly-Silicon films
    Kim, Taesung
    Choi, Jae-Boong
    Kim, Youngjin
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (03) : 1187 - 1190
  • [22] Continuous hot wire chemical vapor deposition of high-density carbon multiwall nanotubes
    Dillon, AC
    Mahan, AH
    Parilla, PA
    Alleman, JL
    Heben, MJ
    Jones, KM
    Gilbert, KEH
    NANO LETTERS, 2003, 3 (10) : 1425 - 1429
  • [23] Inductively coupled reactive high-density plasmas designed for sputter deposition
    Miyake, S
    Setsuhara, Y
    Zhang, JQ
    Kamai, M
    Kyoh, B
    SURFACE & COATINGS TECHNOLOGY, 1997, 97 (1-3): : 768 - 772
  • [24] High density plasma chemical vapor deposition gap-fill mechanisms
    Mungekar, HP
    Lee, YS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (02): : L11 - L15
  • [25] High density plasma enhanced chemical vapor deposition of optical thin films
    Daineka, D
    Bulkin, P
    Girard, G
    Bourée, JE
    Drévillon, B
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2004, 26 (01): : 3 - 9
  • [26] A method for high-density plasma production
    Gerasimov, S.I.
    Zotov, E.V.
    Korotchenko, M.V.
    Krasovskij, G.B.
    Kholin, S.A.
    Fizika Goreniya i Vzryva, 1993, 29 (06): : 113 - 114
  • [27] METHOD FOR OBTAINING HIGH-DENSITY PLASMA
    GERASIMOV, SI
    ZOTOV, EV
    KOROTCHENKO, MV
    KRASOVSKII, GB
    KHOLIN, SA
    COMBUSTION EXPLOSION AND SHOCK WAVES, 1993, 29 (06) : 774 - 775
  • [28] High density plasma chemical vapor deposition of diamond-like carbon films
    Mousinho, AP
    Mansano, RD
    Massi, M
    Zambom, LS
    MICROELECTRONICS JOURNAL, 2003, 34 (5-8) : 627 - 629
  • [29] Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition
    Mousinho, A. P.
    Mansano, R. D.
    15TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP 2014) AND 21ST IAEA TM ON RESEARCH USING SMALL FUSION DEVICES (RUSFD), 2015, 591
  • [30] A comparative study on inductively-coupled plasma high-density plasma, plasma-enhanced, and low pressure chemical vapor deposition silicon nitride films
    Yota, J
    Hander, J
    Saleh, AA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (02): : 372 - 376
12345