Effect of substrate temperature on the structure and hardness of magnetron sputtering deposited carbon nitride films

被引:0
|
作者
Department of Materials Science, Jilin University, Changchun 130023, China [1 ]
不详 [2 ]
不详 [3 ]
机构
来源
Phys Status Solidi A | / 2卷 / 373-378期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
14
引用
收藏
相关论文
共 50 条
  • [11] Correlation between structure and hardness of magnetron sputtering deposited CNx films
    Zheng, WT
    Li, HB
    Wang, YM
    Sundgren, JE
    CHINESE SCIENCE BULLETIN, 1999, 44 (12): : 1149 - 1152
  • [12] Correlation between structure and hardness of magnetron sputtering deposited CNx films
    ZHENG Weitao
    Department of Physics
    Science Bulletin, 1999, (12) : 1149 - 1152
  • [13] Influence of substrate temperature on the morphology and structure of bismuth thin films deposited by magnetron sputtering
    Qin, Xiufang
    Sui, Caiyun
    Di, Lanxin
    VACUUM, 2019, 166 : 316 - 322
  • [14] Optical investigations of the microstructure of carbon nitride films deposited by magnetron sputtering
    Lejeune, M
    Durand-Drouhin, O
    Ballutaud, D
    Benlahsen, M
    SURFACE & COATINGS TECHNOLOGY, 2002, 151 : 242 - 246
  • [15] Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering
    Oliveira, F. S.
    Dias, I. L.
    Araujo, P. L. L.
    Ramirez, D. A.
    Neto, P. C. Silva
    Hubler, R.
    Mendes, F. M. T.
    Damasceno, I. Z.
    Tentardini, E. K.
    MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2023, 26
  • [16] Characterization of carbon nitride thin films deposited by reactive dc magnetron sputtering on various substrate materials
    Zheng, WT
    Hellgren, N
    Sjostrom, H
    Sundgren, JE
    SURFACE & COATINGS TECHNOLOGY, 1998, 100 (1-3): : 287 - 290
  • [17] Substrate geometry effect on the uniformity of amorphous carbon films deposited by unbalanced magnetron sputtering
    Ding, XZ
    Zeng, XT
    Hu, ZQ
    THIN SOLID FILMS, 2004, 461 (02) : 282 - 287
  • [18] Effect of substrate temperature on high rate deposited ZnO:Al films by magnetron sputtering
    Li, Weimin
    Hao, Huiying
    FRONTIERS OF ADVANCED MATERIALS AND ENGINEERING TECHNOLOGY, PTS 1-3, 2012, 430-432 : 480 - 483
  • [19] Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
    Singh, Sukhvinder
    Srinivasa, R. S.
    Major, S. S.
    THIN SOLID FILMS, 2007, 515 (24) : 8718 - 8722
  • [20] The effect of hydrogen on copper nitride thin films deposited by magnetron sputtering
    Zhang, Guangan
    Yan, Pengxun
    Wu, Zhiguo
    Wang, Jun
    Chen, Jiangtao
    APPLIED SURFACE SCIENCE, 2008, 254 (16) : 5012 - 5015