Development of an Orientation-Dependent Anisotropic Etching Simulation System MICROCAD

被引：0
|
作者：
Sato, Kazuo
Asaumi, Kazuo
Kobayashi, Gen
Iriye, Yasuroh
Shikida, Mitsuhiro
机构：
[1] Nagoya University, Nagoya, 464-8603, Japan
[2] Fuji Research Institute Corporation, Tokyo, 101-8443, Japan
来源：
Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi) | 2000年 / 83卷 / 04期
关键词：
D O I：
10.1002/(SICI)1520-6432(200004)83:43.0.CO;2-L
中图分类号：
学科分类号：
摘要：
18
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收藏
页码：13 / 21
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