Conjugated fluorene and polyfluorene containing polymers using the ionene precursor route: Cross-linked light emitting polymer materials
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作者:
Advincula, Rigoberto
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Polymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United StatesPolymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United States
Advincula, Rigoberto
[1
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Xia, Chuanjun
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Polymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United StatesPolymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United States
Xia, Chuanjun
[1
]
Inaoka, Seiji
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Polymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United StatesPolymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United States
Inaoka, Seiji
[1
]
机构:
[1] Polymer Program, Department of Chemistry, University of Alabama at Birmingham, Birmingham, AL 35294-1240, United States
Conjugated fluorene and polyfluorene containing polymers using the ionene precursor route is studied. It is intended to utilize the precursor route in designing electroluminescent polymer materials. With the advantages of the luminescence property of polyfluorenes, the processability of the precursor prior to crosslinking is investigated. Different properties to the precursor polymer that can add another parameter to polymer light emitting diode (PLED) device fabrication is incorporated. For these polyfluorene derivatives via chemical oxidation, alternative methods are addressed to make clean polymers. The conjugated polymer films are formed on the substrate by electrochemical deposition which will simplify the fabrication of PLED.
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Univ Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USAUniv Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
Huang, Fei
Shih, Ping-I
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Univ Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
Natl Chiao Tung Univ, Dept Appl Chem, Hsinchu 300, TaiwanUniv Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
Shih, Ping-I
Liu, Michelle S.
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Univ Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USAUniv Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
Liu, Michelle S.
Shu, Ching-Fong
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Natl Chiao Tung Univ, Dept Appl Chem, Hsinchu 300, TaiwanUniv Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
Shu, Ching-Fong
Jen, Alex K. -Y.
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Univ Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USAUniv Washington, Inst Adv Mat & Technol, Dept Mat Sci & Engn, Seattle, WA 98195 USA
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Tel Aviv Univ, Univ Ctr Nanosci & Nanotechnol, IL-69998 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Hendler, Netta
Wildeman, Jurjen
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Univ Groningen, Dept Polymer Chem, Zernike Inst Adv Mat, NL-9747 AG Groningen, NetherlandsTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Wildeman, Jurjen
Mentovich, Elad. D.
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Tel Aviv Univ, Univ Ctr Nanosci & Nanotechnol, IL-69998 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Mentovich, Elad. D.
Schnitzler, Tobias
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Univ Groningen, Dept Polymer Chem, Zernike Inst Adv Mat, NL-9747 AG Groningen, NetherlandsTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Schnitzler, Tobias
Belgorodsky, Bogdan
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Belgorodsky, Bogdan
Prusty, Deepak K.
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Univ Groningen, Dept Polymer Chem, Zernike Inst Adv Mat, NL-9747 AG Groningen, NetherlandsTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Prusty, Deepak K.
Rimmerman, Dolev
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Tel Aviv Univ, Univ Ctr Nanosci & Nanotechnol, IL-69998 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Rimmerman, Dolev
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Herrmann, Andreas
Richter, Shachar
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel
Tel Aviv Univ, Univ Ctr Nanosci & Nanotechnol, IL-69998 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69998 Tel Aviv, Israel