Application of a thin-resist process for KrF imaging to 130 nm device fabrication

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作者：
Azuma, Tsukasa
Chiba, Kenji
Kawamura, Daisuke
Miyoshi, Seiro
Ozaki, Tohru
Kageyama, Hiroyoshi
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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | / 17卷
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页码：2519 / 2523
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