MOLECULAR AND ION-BEAM EPITAXY SYSTEM FOR THE GROWTH OF III-V COMPOUND SEMICONDUCTORS USING A MASS-SEPARATED, LOW-ENERGY GROUP-V ION BEAM.

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作者：
Shimizu, Saburo [1 ]
Tsukakoshi, Osamu [1 ]
Komiya, Souji [1 ]
Makita, Yunosuke [1 ]
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[1] ULVAC Corp, Chigasaki, Jpn, ULVAC Corp, Chigasaki, Jpn
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| 1600年 / 24期
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