Sputtering yield measurements during low energy xenon plasma bombardment

被引：0
|
作者：
Doerner, R.P. [1 ]
Whyte, D.G. [2 ]
Goebel, D.M. [3 ]
机构：
[1] Center for Energy Research, Univ. of California at San Diego, San Diego, CA 92093, United States
[2] University of Wisconsin-Madison, Madison, WI 53706, United States
[3] Boeing Space and Communications, Torrance, CA 90505, United States
来源：
Journal of Applied Physics | 2003年 / 93卷 / 09期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
21
引用
收藏
页码：5816 / 5823
相关论文
共 50 条
  • [11] Carbon atom and cluster sputtering under low-energy noble gas plasma bombardment
    Oyarzabal, E.
    Doerner, R. P.
    Shimada, M.
    Tynan, G. R.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (04)
  • [12] SPUTTERING OF TIC COATING BY LOW-ENERGY AND HIGH-FLUX PLASMA BOMBARDMENT IN PISCES
    FRANCONI, E
    BROSSA, F
    JOURNAL OF NUCLEAR MATERIALS, 1991, 179 : 294 - 297
  • [13] Differential sputter yield profiles of molybdenum due to bombardment by low energy xenon ions at normal and oblique incidence
    Yalin, A. P.
    Williams, J. D.
    Surla, V.
    Zoerb, K. A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (10) : 3194 - 3202
  • [14] ENERGY AND FLUENCE DEPENDENCE OF THE SPUTTERING YIELD OF SILICON BOMBARDED WITH ARGON AND XENON
    BLANK, P
    WITTMAACK, K
    JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) : 1519 - 1528
  • [15] SPUTTERING OF MOLYBDENUM BY LOW-ENERGY HE+ BOMBARDMENT
    SAIKI, K
    TANAKA, H
    TANAKA, S
    KOMA, A
    JOURNAL OF NUCLEAR MATERIALS, 1981, 97 (1-2) : 173 - 178
  • [16] Electronic sputtering of halides by low energy ion and electron bombardment
    Poradzisz, A.
    Postawa, Z.
    Rutkowski, J.
    Szymonski, M.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1988, B33 (1-4) : 830 - 833
  • [17] Application of secondary neutral mass spectrometry in low-energy sputtering yield measurements
    Bhattacharjee, S
    Zhang, J
    Shutthanandan, V
    Ray, PK
    Shivaparan, NR
    Smith, RJ
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 129 (01): : 123 - 129
  • [18] Low energy sputtering of nickel by normally incident xenon ions
    Zhou, XW
    Wadley, HNG
    Sainathan, S
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 234 (04): : 441 - 457
  • [19] Effect of low-energy ion bombardment during the sputtering on the crystal structure of FePt films
    Naumov, V. V.
    Il'yashenko, E. I.
    FUNCTIONAL MATERIALS, 2008, 15 (03): : 356 - 363
  • [20] SPUTTERING OF MOLECULES DURING LOW-ENERGY ELECTRON-BOMBARDMENT OF ALKALI-HALIDES
    SZYMONSKI, M
    OVEREIJNDER, H
    VRIES, AED
    SURFACE SCIENCE, 1979, 90 (02) : 274 - 279
12345