Development of electron-beam x-ray mask writer

被引：0
|
作者：
Morosawa, T.
Saito, K.
Kunioka, T.
Ohki, S.
Watanabe, T.
Takeda, Y.
Kato, J.
机构：
来源：
NTT R and D | 2001年 / 50卷 / 06期
关键词：
Pattern data processing software - X-ray masks;
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页码：405 / 413
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