Patterning characteristics of hole patterns in synchrotron radiation lithography

被引：0
|
作者：
Nakanishi, Kazuya [1 ]
Deguchi, Kimiyoshi [1 ]
Matsuda, Tadahito [1 ]
机构：
[1] NTT System Electronics Lab, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 4 A期
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D O I：
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学科分类号：
摘要：
11
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页码：2062 / 2065
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