Etching of amorphous Al2O3 produced by ion implantation

被引：0
|
作者：
McHargue, Carl J. [1 ]
Hunn, John D. [1 ]
Joslin, Debra L. [1 ]
Alves, E. [1 ]
da Silva, M.F. [1 ]
Soares, J.C. [1 ]
机构：
[1] Univ of Tennessee, Knoxville, United States
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1997年 / 127-128卷
关键词：
Number:; DE-ACOS-96OR22464a; Acronym:; USDOE; Sponsor: U.S. Department of Energy; -; Sponsor: Lockheed Martin;
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页码：596 / 598
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