Study on the YBCO amorphous films prepared by D.C. magnetron sputtering through Rutherford backscattering (RBS) analysis technique

被引：0
|
作者：
Jiang, Weilin [1 ]
Wang, Ruilan [1 ]
Zhu, Peiran [1 ]
Wang, Changan [1 ]
Xu, Tianbing [1 ]
Li, Hongcheng [1 ]
Zhai, Yongliang [1 ]
Ren, Mengmei [1 ]
Zhou, Junsi [1 ]
机构：
[1] Inst of Physics, Beijing, China
来源：
Wuli Xuebao/Acta Physica Sinica | 1994年 / 43卷 / 04期
关键词：
9;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：660 / 666
相关论文
共 50 条
  • [21] Microstructure and Properties of ITO and ITO/Ag/ITO Multilayer Thin Films Prepared by D.C. Magnetron Sputtering
    Choi, Yong-Lak
    Kim, Seon-Hwa
    KOREAN JOURNAL OF MATERIALS RESEARCH, 2006, 16 (08): : 490 - 496
  • [22] Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
    Abe, Yoshiyuki
    Ishiyama, Noriko
    JOURNAL OF MATERIALS SCIENCE, 2006, 41 (22) : 7580 - 7584
  • [23] Mechanical and tribological characterization of CNx films deposited by d.c. magnetron sputtering
    Ipaz, L.
    Yate, L.
    Polcar, T.
    Camps, E.
    Escobar-Alarcon, L.
    Zambrano, G.
    Prieto, P.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4, NO 11, 2007, 4 (11): : 4267 - +
  • [24] Effect of tantalum addition on optical transmittance and electrical resistivity of TiN thin films prepared by d.c. magnetron sputtering
    Bourbia, O
    Achour, S
    Zerkout, S
    Benkahoul, M
    Harabi, A
    EURO CERAMICS VII, PT 1-3, 2002, 206-2 : 523 - 526
  • [25] Indium-doped zinc oxide films prepared by simultaneous r.f. and d.c. magnetron sputtering
    Zhang, KR
    Zhu, FR
    Huan, CHA
    Wee, ATS
    Osipowicz, T
    SURFACE AND INTERFACE ANALYSIS, 1999, 28 (01) : 271 - 274
  • [26] Study of ZnS thin films prepared by RF magnetron sputtering technique
    Xie Jing
    Li Bing
    Li Yuan-jie
    Yan Pu
    Feng Liang-Huan
    Cai Ya-Ping
    Zheng Jia-Gui
    Zhang Jing-Quan
    Li Wei
    Wu Li-Li
    Lei Zhi
    Zeng Guang-Gen
    ACTA PHYSICA SINICA, 2010, 59 (08) : 5749 - 5754
  • [27] Preparation and characterization of CuxO/Cu thin films by reactive d.c. magnetron sputtering
    Yesilçubuk, SA
    Alkoy, S
    Addemir, O
    Sesen, K
    Oral, AY
    EURO CERAMICS VIII, PTS 1-3, 2004, 264-268 : 569 - 572
  • [28] Rutherford backscattering spectroscopy of amorphous films of Ag-As-S system prepared by spin-coating technique
    Wágner, T
    Kohoutek, T
    Perina, V
    Mackova, A
    Hnatowitz, V
    Wagner, T
    Kasap, SO
    Krbal, M
    Frumar, M
    Vlcek, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 219 : 875 - 879
  • [29] Cuprous oxide (Cu2O) thin films prepared by reactive d.c. sputtering technique
    Dolai, S.
    Das, S.
    Hussain, S.
    Bhar, R.
    Pal, A. K.
    VACUUM, 2017, 141 : 296 - 306
  • [30] The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering
    Ju, Yongfeng
    Wu, Zhiming
    Qiu, Yonglong
    Li, Lin
    Jiang, Yadong
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
12345