NEW ANALYTICAL MODEL FOR SPIN COATING PROCESS WITH SOLVENT EVAPORATION.

被引：0
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作者：
Shimoji, Sadao [1 ]
机构：
[1] Tokyo Engineering Univ, Tokyo, Jpn, Tokyo Engineering Univ, Tokyo, Jpn
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1987年 / 26卷 / 06期
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