New process for depositing tungsten nitride thin films

被引：0
|
作者：
Texas Instruments, Dallas, United States [1 ]
机构：
来源：
J Electrochem Soc | / 2卷 / L21-L23期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Semiconducting films
引用
收藏
相关论文
共 50 条
  • [41] PRODUCTION OF THIN TUNGSTEN FILMS
    BALALIKIN, NI
    BUCH, J
    KATRASEV, VV
    SKRYPNIK, AV
    THIN SOLID FILMS, 1976, 38 (03) : 255 - 260
  • [42] SUPERCONDUCTIVITY IN TUNGSTEN THIN FILMS
    POLLACK, SR
    BASAVAIA.S
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1968, 13 (03): : 476 - &
  • [43] New approach in the monitoring and characterization of titanium nitride thin films
    Logothetidis, S
    Meletis, EI
    Kourouklis, G
    JOURNAL OF MATERIALS RESEARCH, 1999, 14 (02) : 436 - 441
  • [44] New approach in the monitoring and characterization of titanium nitride thin films
    S. Logothetidis
    E. I. Meletis
    G. Kourouklis
    Journal of Materials Research, 1999, 14 : 436 - 441
  • [45] THIN OXIDE FILMS ON TUNGSTEN
    GULBRANSEN, EA
    WYSONG, WS
    TRANSACTIONS OF THE AMERICAN INSTITUTE OF MINING AND METALLURGICAL ENGINEERS, 1948, 175 : 611 - 627
  • [46] Chemical Bath Deposition and Laser Annealing: A Low Cost Fast Process for Depositing CdTe Thin Films
    Misra, Sudhajit
    Hymas, Mitchell C.
    Lund, Elizabeth A.
    Pruzan, Dennis
    Scarpulla, Michael A.
    2016 IEEE 43RD PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2016, : 462 - 464
  • [47] Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films
    Pilvi, Tero
    Ritala, Mikko
    Leskelae, Markku
    Bischoff, Martin
    Kaiser, Ute
    Kaiser, Norbert
    APPLIED OPTICS, 2008, 47 (13) : C271 - C274
  • [48] New approaches to the atomic layer deposition of tantalum nitride and titanium nitride thin films
    Juppo, M
    Alén, P
    Ritala, M
    Leskelä, M
    ADVANCED METALLIZATION CONFERENCE 2001 (AMC 2001), 2001, : 633 - 640
  • [49] New deposition source for depositing high rate metal and polymeric doped ceramic thin films
    Felts, JT
    TWELFTH INTERNATIONAL CONFERENCE ON VACUUM WEB COATING CONFERENCE, PROCEEDINGS OF, 1998, : 45 - 59
  • [50] Structural and Morphological Investigations of Deposited Tungsten Nitride Thin Films Using Plasma Focus Device
    Hosseinnejad, M. T.
    Etaati, G. R.
    Ghoranneviss, M.
    Shirazi, M.
    Ghorannevis, Z.
    JOURNAL OF FUSION ENERGY, 2011, 30 (05) : 382 - 387
12345