Pressure dependent two-dimensional electron transport in defect doped InGaAs/InP heterostructures

被引:0
|
作者
Wasik, D. [1 ]
Dmowski, L. [1 ]
Mikucki, J. [1 ]
Lusakowski, J. [1 ]
Hsu, L. [1 ]
Walukiewicz, W. [1 ]
Bi, W.G. [1 ]
Tu, C.W. [1 ]
机构
[1] Warsaw Univ, Warsaw, Poland
来源
Materials Science Forum | 1997年 / 258-263卷 / pt 2期
关键词
Charge transfer - Crystal impurities - Electric resistance - Electron sources - Hydrostatic pressure - Interfaces (materials) - Pressure effects - Semiconducting indium phosphide - Semiconductor device structures - Semiconductor doping - Semiconductor growth - Transport properties;
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摘要
We have measured the transport properties of InGaAs/InP heterostructures where donor-like native defects incorporated in a low temperature grown InP barrier are used as a source of electrons. Conductance of such structures shows comparable contributions from low mobility electrons in the InP barrier and from the two-dimensional electron gas (2DEG) at the heterostructure interface. We used high hydrostatic pressure to eliminate the low mobility conductance and were able to determine the parameters of two-dimensional electron gas. We find that the highest two-dimensional electron mobility of 3×104 cm2/Vs is determined by the scattering from the background ionized impurities located in the InGaAs quantum well.
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页码:813 / 818
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