New approach for measuring oxide thickness

被引：0
|
作者：
Miller, Tom G. [1 ]
机构：
[1] Keithley Instruments, Inc, Cleveland, United States
来源：
Semiconductor International | 1995年 / 18卷 / 08期
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D O I：
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学科分类号：
摘要：
1
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页码：147 / 148
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