Radiation chemistry of poly(lactides) as new polymer resists for the LIGA process

被引：0
|
作者：
Wollersheim, O. [1 ]
Zumaque, H. [1 ]
Hormes, J. [1 ]
Langen, J. [1 ]
Hoessel, P. [1 ]
Haeussling, L. [1 ]
Hoffman, G. [1 ]
机构：
[1] Physikalisches Inst der Universitaet, Bonn, Bonn, Germany
来源：
| 1600年 / Institute of Physics Publishing Ltd, Bristol, United Kingdom卷 / 04期
关键词：
Galvanoplating - Irradiation chamber - Poly lactides;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] RADIATION-CHEMISTRY OF POLY(LACTIDES) AS NEW POLYMER RESISTS FOR THE LIGA PROCESS
    WOLLERSHEIM, O
    ZUMAQUE, H
    HORMES, J
    LANGEN, J
    HOESSEL, P
    HAUSSLING, L
    HOFFMANN, G
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1994, 4 (02) : 84 - 93
  • [2] THE RADIATION-CHEMISTRY OF POLY(METHYL METHACRYLATE) POLYMER RESISTS
    LEHOCKEY, EM
    REID, I
    HILL, I
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2221 - 2225
  • [3] Radiation Chemistry in Chemically Amplified Resists
    Kozawa, Takahiro
    Tagawa, Seiichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (03)
  • [4] Radiation chemistry in chemically amplified resists
    Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
    Jpn. J. Appl. Phys., 3 PART 1
  • [5] ADVANCES IN THE CHEMISTRY OF RESISTS FOR IONIZING-RADIATION
    DAMMEL, R
    POLYMERS FOR MICROELECTRONICS: RESISTS AND DIELECTRICS, 1994, 537 : 252 - 281
  • [6] CHEMISTRY AND PROCESS FOR DEEP-UV RESISTS
    REICHMANIS, E
    THOMPSON, LE
    MICROELECTRONIC ENGINEERING, 1991, 14 (3-4) : 215 - 226
  • [7] QUANTITATIVE STUDIES OF THE RADIATION-CHEMICAL BEHAVIOR OF PMMA AND POLY(LACTIDES)
    WOLLERSHEIM, O
    ZUMAQUE, H
    HORMES, J
    KADEREIT, D
    LANGEN, J
    HAUSSLING, L
    HOESSEL, P
    HOFFMANN, G
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 97 (1-4): : 273 - 278
  • [8] Development of new polymer resists for nanoimprint lithography
    Guo, L. Jay
    Pina-Hernandez, Carlos
    Choi, Philip
    Cheng, Xing
    Fu, Peng-Fei
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [9] Influence of the chemical structure of (co)polymer resists on their sensitivity to radiation
    S. A. Bulgakova
    M. M. Johns
    E. A. Kiseleva
    E. V. Skorokhodov
    A. E. Pestov
    A. Ya. Lopatin
    S. A. Gusev
    V. I. Luchin
    N. I. Chkhalo
    N. N. Salashchenko
    Bulletin of the Russian Academy of Sciences: Physics, 2012, 76 (2) : 159 - 162
  • [10] The radiation chemistry of poly(dimethylsiloxane)
    Hill, DJT
    Preston, CML
    Whittaker, AK
    Hunt, SM
    MACROMOLECULAR SYMPOSIA, 2000, 156 : 95 - 102
12345