Variation of Xe concentration in a high pressure Ar/Xe laser with coaxial e-beam pumping

被引：0

作者：

Lan, Y.F. ^{[1
]}

Peters, P.J.M. ^{[1
]}

Witteman, W.J. ^{[1
]}

机构：

[1] Inst of Electronics, Beijing, China

来源：

Chinese Journal of Lasers B (English Edition) | 1993年 / B2卷 / 03期

关键词：

Argon - Composition effects - Electron beam pumping - Xenon;

D O I：

暂无

中图分类号：

TN248.2 [气体激光器];

学科分类号：

摘要：

A series of measurements on the high pressure (up to 18 bar) coaxial e-beam pumped Ar/Xe laser were made at high power loading (up to 25 MW/cm2) for various Xe mole fraction in Ar. It was found that the optimum laser gas composition in the system was 0.4% Xe in Ar which was independent of the total gas pressure. At the optimum gas composition the output energy increased with increasing total gas pressure up to 16 bar, but the intrinsic efficiency reached a maximum at the total gas pressure of 8 bar. The experimental results suggest that the heavy particle quenching from Ar at high gas pressure plays a very important role in laser kinetics of the e-beam pumped Ar/Xe laser.

引用

页码：199 / 206

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