Molecular design for new positive electron-beam resists

被引：0
|
作者：
Nagasaki, Yukio
机构：
来源：
ACS Symposium Series | / 706卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：276 / 289
相关论文
共 50 条
  • [31] LANGMUIR-BLODGETT ELECTRON-BEAM RESISTS
    PETERSON, IR
    IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1983, 130 (05): : 252 - 255
  • [32] ORGANIC RESISTS FOR ELECTRON-BEAM LITHOGRAPHY - A REVIEW
    MITRA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C374 - C374
  • [33] PLASMA-DEVELOPABLE ELECTRON-BEAM RESISTS
    YONEDA, Y
    FUKUYAMA, S
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1987, 23 (01): : 37 - 43
  • [34] REACTIVE PLASTICIZERS IN NEGATIVE ELECTRON-BEAM RESISTS
    NAMASTE, YMN
    OBENDORF, SK
    RODRIGUEZ, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2245 - 2248
  • [35] Monolayers of fluorinated silanes as electron-beam resists
    StJohn, PM
    Craighead, HG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 69 - 74
  • [36] POLY(OLEFIN SULFONE) ELECTRON-BEAM RESISTS
    PAMPALONE, TR
    JOURNAL OF IMAGING SCIENCE, 1986, 30 (04): : 160 - 166
  • [37] THEORETICAL CONSIDERATIONS ON SENSITIVITIES OF ELECTRON-BEAM RESISTS
    TSUDA, M
    OIKAWA, S
    SUZUKI, A
    POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06): : 390 - 395
  • [38] HIGHLY SENSITIVE POSITIVE ELECTRON-BEAM RESISTS BY ADDING QUATERNARY AMMONIUM-SALTS
    HAMADA, Y
    TSUJINO, Y
    YAMAZAKI, S
    KUROKI, K
    KUWANO, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (10) : 2606 - 2610
  • [39] POSITIVE-WORKING ELECTRON-BEAM RESISTS BASED ON MALEIC-ANHYDRIDE COPOLYMERS
    POHL, KU
    RODRIGUEZ, F
    NAMASTE, YMN
    OBENDORF, SK
    ACS SYMPOSIUM SERIES, 1984, 266 : 323 - 338
  • [40] RESPONSE OF DIAZOQUINONE RESISTS TO OPTICAL AND ELECTRON-BEAM EXPOSURE
    KAPLAN, M
    MEYERHOFER, D
    RCA REVIEW, 1979, 40 (02): : 166 - 190
12345