Influence of B2H6/CH4 and B(CH3)3 as process gas on boron carbide coatings: An in situ photoelectron spectroscopy study

被引：0

作者：

Kunzli, H. ^{[1
]}

Gantenbein, P. ^{[1
]}

Steiner, R. ^{[1
]}

Oelhafen, P. ^{[1
]}

机构：

[1] Inst fur Physik der Universitat, Basel, Basel, Switzerland

来源：

Journal of Nuclear Materials | 1992年 / 196-98卷

关键词：

Boron carbide;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：622 / 626

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