HIGH RESOLUTION FABRICATION TECHNOLOGY.

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作者：
Chang, T.H.P.
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IAHS-AISH Publication (International Association of Hydrological Sciences-Association Internationale des Sciences Hydrologiques) | 1978年
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摘要：
Recent advances in LSI technology demonstrate a continuing trend towards increased circuit complexity with reduced pattern geometries. In order to meet these developments, the need has arisen for new improved lithography systems. Several high resolution systems are being explored, including the optical systems (also X-ray) and the electron beam systems. This paper describes and assesses these different approaches.
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页码：473 / 476
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