Step-flow growth on vicinal GaAs surfaces by migration-enhanced epitaxy

被引:0
|
作者
机构
[1] Yamaguchi, Hiroshi
[2] Horikoshi, Yoshiji
来源
Yamaguchi, Hiroshi | 1600年 / 28期
关键词
Semiconducting Gallium Arsenide;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] MISORIENTATION IN GAAS ON SI GROWN BY MIGRATION-ENHANCED EPITAXY - COMMENTS
    RIESZ, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (10): : 4754 - 4755
  • [42] OPTICAL INVESTIGATION OF GAAS GROWTH-PROCESS IN MOLECULAR-BEAM EPITAXY AND MIGRATION-ENHANCED EPITAXY
    HORIKOSHI, Y
    KAWASHIMA, M
    KOBAYASHI, N
    JOURNAL OF CRYSTAL GROWTH, 1991, 111 (1-4) : 200 - 204
  • [43] MIGRATION-ENHANCED EPITAXY GROWTH AND CHARACTERIZATION OF HIGH-QUALITY ZNSE/GAAS SUPERLATTICES
    RAMESH, S
    KOBAYASHI, N
    HORIKOSHI, Y
    APPLIED PHYSICS LETTERS, 1990, 57 (11) : 1102 - 1104
  • [44] Growth mechanism of GaAs microdisk structures by area-selective epitaxy using migration-enhanced epitaxy
    Iwai, Takayuki
    Toda, Takeshi
    Uehara, Takahiro
    Yoshiba, Ippei
    Horikoshi, Yoshiji
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (02): : 514 - 517
  • [45] Growth of GaAs on (100) Ge and vicinal Ge surface by migration enhanced epitaxy
    Tanoto, Hendrix
    Yoon, Soon F.
    Loke, Wan K.
    Fitzgerald, Eugene A.
    Dohrman, Carl
    Narayanan, Balasubramanian
    Tung, Chih H.
    PROGRESS IN SEMICONDUCTOR MATERIALS V-NOVEL MATERIALS AND ELECTRONIC AND OPTOELECTRONIC APPLICATIONS, 2006, 891 : 139 - +
  • [46] ANOMALOUS DISTRIBUTION OF IN ATOMS IN GAAS DURING MIGRATION-ENHANCED EPITAXY
    YAMAGUCHI, H
    HORIKOSHI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (11): : L2010 - L2012
  • [47] Comments on 'misorientation in GaAs on Si grown by migration-enhanced epitaxy'
    Riesz, Ferenc
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (10): : 4754 - 4755
  • [48] Growth mechanism in migration-enhanced epitaxy of AlAs on misoriented GaAs(111)B substrates
    Takano, Yasushi
    Torihata, Teiji
    Kawai, Takahiro
    Pak, Kangsa
    Yonezu, Hiroo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1990, 29 (08): : 1346 - 1349
  • [49] APPLICATION OF REFLECTANCE DIFFERENCE SPECTROSCOPY (RDS) TO MIGRATION-ENHANCED EPITAXY (MEE) GROWTH OF GAAS
    BRIONES, F
    HORIKOSHI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1990, 29 (06): : 1014 - 1021
  • [50] INITIAL GROWTH-CONDITIONS OF GAAS ON (100)SI GROWN BY MIGRATION-ENHANCED EPITAXY
    STOLZ, W
    NAGANUMA, M
    HORIKOSHI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (03): : L283 - L286