In-situ spectroscopic ellipsometry for monitoring the Ti-Si multilayers during growth and annealing

被引:0
|
作者
Aristotle Univ of Thessaloniki, Thessaloniki, Greece [1 ]
机构
来源
Thin Solid Films | / 1-2卷 / 44-47期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Multilayers
引用
收藏
相关论文
共 50 条
  • [21] Monitoring the evolution of optical coatings during thermal annealing with real-time, in situ spectroscopic ellipsometry
    Colace, Stefano
    Samandari, Shima
    Granata, Massimo
    Amato, Alex
    Caminale, Michael
    Michel, Christophe
    Gemme, Gianluca
    Pinard, Laurent
    Canepa, Maurizio
    Magnozzi, Michele
    CLASSICAL AND QUANTUM GRAVITY, 2024, 41 (17)
  • [22] Monitoring of CdTe atomic layer epitaxy using in-situ spectroscopic ellipsometry
    S. Dakshinamurthy
    I. Bhat
    Journal of Electronic Materials, 1998, 27 : 521 - 526
  • [23] AMORPHOUS TI-SI ALLOY FORMED BY INTERDIFFUSION OF AMORPHOUS SI AND CRYSTALLINE TI MULTILAYERS
    HOLLOWAY, K
    SINCLAIR, R
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (04) : 1359 - 1364
  • [24] IN-SITU X-RAY-DIFFRACTION STUDY OF THE FORMATION OF TISI2-C49 PHASE FROM TI-SI MULTILAYERS ON SI(100)
    SARIEL, J
    CHEN, HD
    JONGSTE, JF
    RADELAAR, S
    MATERIALS CHEMISTRY AND PHYSICS, 1995, 40 (02) : 82 - 86
  • [25] IN-SITU MONITORING AND CONTROL OF MOCVD GROWTH USING MULTIWAVELENGTH ELLIPSOMETRY
    PITTAL, S
    JOHS, B
    HE, P
    WOOLLAM, JA
    MURTHY, SD
    BHAT, IB
    COMPOUND SEMICONDUCTORS 1994, 1995, (141): : 41 - 44
  • [26] HYDROGEN TRANSPORT IN Fe/Ti NANOMETER-SCALE MULTILAYERS DURING IN-SITU LOW TEMPERATURE ANNEALING
    Wu, Z. L.
    Cao, B. S.
    Peng, T. X.
    Chen, T.
    Lei, M. K.
    TMS 2009 138TH ANNUAL MEETING & EXHIBITION - SUPPLEMENTAL PROCEEDINGS, VOL 1: MATERIALS PROCESSING AND PROPERTIES, 2009, : 567 - 571
  • [27] STRESSES IN SPUTTERED TI-SI MULTILAYERS AND POLYCRYSTALLINE SILICIDE FILMS
    WESSELS, PJJ
    JONGSTE, JF
    JANSSEN, GCAM
    MULDER, AL
    RADELAAR, S
    LOOPSTRA, OB
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (10) : 4979 - 4982
  • [28] In-situ growth studies of sputtered YBCO thin films by spectroscopic ellipsometry
    Bijlsma, ME
    Blank, DHA
    Wormeester, H
    vanSilfhout, A
    Rogalla, H
    JOURNAL OF ALLOYS AND COMPOUNDS, 1997, 251 (1-2) : 15 - 18
  • [29] In-situ spectroscopic ellipsometry:: optimization of monitoring and closed-loop-control procedures
    Humlicek, J.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (04): : 793 - 796
  • [30] Annealing of chemically vapor deposited nanoscale Ti-Si islands on Si
    Kamins, TI
    Williams, RS
    Ohlberg, DAA
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 80 (06): : 1279 - 1286