FABRICATION OF TENTH-MICRON SCALE STRUCTURES FOR SEMICONDUCTOR LASER DEVICES.

被引：2
|
作者：
Fice, M.J. [1 ]
Ahmed, H. [1 ]
Clements, S.J. [1 ]
机构：
[1] Cambridge Univ, Cambridge, Engl, Cambridge Univ, Cambridge, Engl
来源：
Microelectronic Engineering | 1987年 / 6卷 / 1-4期
关键词：
We thank R. Glew for MOCVD growth of the quantum well material and K. Hilton of RSRE; Malvern; UK; for performing the semiconductor dry etching of the quantum dot structures. The support of the Science and Engineering Research Council is acknowledged;
D O I：
10.1016/0167-9317(87)90036-0
中图分类号：
学科分类号：
摘要：
7
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页码：189 / 194
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