Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data

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作者：
Krukar, Richard
Kornblit, Avi
Clark, Linda A.
Kruskal, Joseph
Lambert, Diane
Reitman, Edward A.
Gottscho, Richard A.
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Journal of Applied Physics | 1993年 / 74卷 / 06期
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